PlasmaQuant 9100 Series
Reveal the Details That Matter
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PlasmaQuant 9100 Series
Reveal anything – experience innovative high-end technology and explore the elemental details of your samples for superior product quality, process monitoring and regulation compliance.
Add Clarity, Simplicity, and Confidence to Your Most Delicate Analytical Routines
The unique performance of PlasmaQuant 9100 ICP-OES instruments is a result of all its features combined like the high spectral resolution, the powerful plasma system, the smart torch design and the flexible dual view feature. Especially the interplay of spectral resolution, matrix tolerance and sensitivity opens a tremendous analytical potential for trace element analysis in almost any sample type with particular advantages for high matrix samples. The spectral resolution allows for using the most sensitive emission lines, the matrix tolerance allows for running highly concentrated sample aliquots, even undiluted volatile organics or highly concentrated salt solutions, and the sensitivity provides a high light throughput and ideal signal to background rations.
- Cost-efficient shift-work operation
- Flexible plasma observation
- Interference-free emission lines
- System readiness within 15 minutes
Extended Analytical Capabilities and Results You Can Rely On
The PlasmaQuant 9100 ICP-OES series of Analytik Jena offers a multitude of innovative features to provide a powerful analytical tool with the best possible ICP-OES performance and a broad applicability from routine analyses to highly complex analytical tasks. The PlasmaQuant 9100 ICP-OES series consists of two models, the PlasmaQuant 9100 routine allrounder and the PlasmaQuant 9100 Elite high-performance ICP-OESIt comprises four main features alongside a multitude of tuning possibilities and features to provide the full suite of analytical possibilities.
The main features are:
- V Shuttle torch, which offers a long lifetime of torch components, minimizes maintenance and reduces wash-out and sample deposition related issues
- High frequency generator, which provides a plasma of extraordinary robustness to run any sample type with minimum efforts and maximum emission yields
- Dual View Plus plasma observation modes to increase the instruments working range to a maximum, minimize sample preparation efforts and allow for efficient measurements
- High-resolution optical system to provide interference-free analysis in any kind of sample matrix with highly reliable data quality.
PlasmaQuant 9100
With a clear emphasis on broad applicability, simplicity and cost-effectiveness in general applications, the PlasmaQuant 9100 is not just another ICP-OES. With high-performance features, it allows for more matrix tolerance, a wide working range and high measurement sensitivity. It provides high-quality results in contract analysis, reliability in quality control and the highest standards in regulated industries. Whether aiming for on-off measurements, method flexibility in shift-operation or continuous aspiration of challenging samples, the PlasmaQuant 9100 is your instrument of choice.
PlasmaQuant 9100 Elite
High spectral resolution: the extra that makes the difference in ICP-OES. The PlasmaQuant 9100 Elite uncovers spectral details like no other ICP-OES. Removing common spectral interferences minimizes compromises in line selection and allows the use of highly sensitive emission lines for every application. In combination with its matrix tolerance and superior sensitivity, this enables previously unconceived analytical potential with superior precision, accuracy and detection limits in any sample type. The PlasmaQuant 9100 Elite is the number one choice for spectral resolution, sensitivity and the ideal solution for your most delicate analytical routines.
The configuration of the PlasmaQuant 9100 instruments can be tailored to the specific needs of each application. A range of accessories and upgrade options provide a high level of application flexibility, easy sample handling, and high throughput. Application-specific sample introduction kits for the analysis of low-matrix sample types, saline or metal samples with high matrix content, hydrofluoric acid containing samples or organic samples are available. A variety of compatible autosamplers allows the automation of the sample analysis and minimizes the hands-on-time for operators. There is a range of autosamplers that can be configured, from standard autosamplers for aqueous solutions via samplers for organic samples of different viscosity to automatic dilution stations to maximize the automation of the laboratory workflow. Additionally, autosamplers can be complemented by rapid sample introduction systems to increase sample throughput and the profitability of the ICP-OES system. The PlasmaQuant 9100 is always ready. Fast system warm-up and a self-aligning spectrometer by using an internal Neon correction guarantee system availability within a few minutes and therefore enables a highly economic instrument utilization.
The ability to run complex and concentrated samples, resolve severe spectral interferences, detect trace and ultra-trace concentrations and work across a wide concentration range make the PlasmaQuant 9100 the ideal tool for industrial QC and R&D labs as well as contract and state authority labs with challenging sample types and stringent quality requirements. Clients from various industries, e.g. oil & gas, metals & mining and chemicals trust in its performance and stability. The PlasmaQuant 9100 guarantees the competitive advantage of your lab in terms of extended analytical capabilities, analysis quality and cost-effectiveness
Innovative Solutions – Setting New Standards in the Analytical Performance of ICP-OES
High-resolution optics, high sensitivity, high confidence in results
The unique resolving power of the high-resolution optics guarantees unmatched sensitivity, accuracy and precision in real sample matrices. This well-established encapsulated echelle spectrometer utilizes a double monochromator set-up along with the latest high-resolution CCD detector and enables access to any emission line in the spectral window of 160 to 900 nm. With a spectral resolution of 2 pm @ 200 nm, even severe interferences in challenging samples can be resolved. Select the best emission line for your analytical task from over 43,000 lines and reveal the details of your samples. The availability of interference-free emission lines with high sensitivity allows for robust trace element analysis and highest confidence in results. Internal neon correction ensures a wavelength accuracy of less than 0.4 pm without laborious calibration procedures and allows for a system readiness within 15 minutes.
- High flexibility through the largest selection of emissions lines
- Superior accuracy thanks to interference-free analysis
- Powerful detectability of trace elements in real samples
- Fast measurement readiness
Intuitive handling – V Shuttle Torch
The convenient plug-and-play design of the fully demountable V Shuttle Torch simplifies maintenance and minimizes torch handling needs. Individually interchangeable torch components allow for maximum methodological flexibility while reducing the cost of consumables. All torch gases are automatically connected when the shuttle locks into a rail guide, on which it easily slides into the sampling position. This setup allows the torch to be mounted quickly with no need for alignment and increases the availability of the instrument. The vertical plasma orientation allows highly concentrated sample aliquots to be run and provides increased accuracy, minimizes blank values, and allows a wide range of samples to be analyzed without wet chemical pre-treatment. Excellent long-term plasma performance without clogging and soot formation is a reality, even for the most challenging samples.
- Less torch handling and increased instrument up-time
- Broad applicability and superior analytical performance
- Cost-efficient operation
- Torch mounting process with no need for alignment
Flexible plasma observation – Dual View PLUS
The analysis of trace elements and major constituents requires different plasma observation modes and the flexibility to apply any mode, radial and axial, to any emission line in a single method. Dual View PLUS enables the free selection of 2+2 plasma views in every sample for synchronous analysis of contents ranging from sub-ppb to high weight percent. The availability of automatic attenuators in any observation mode allow for the widest possible working range in ICP-OES. Spectral interferences from the cold plasma tail are eliminated thanks to the latest argon-neutral counter-gas technology that neither disrupts the stability of the vertical plasma nor reduces the length of its analytical zone. Dual View PLUS allows for robust trace element analysis with unique sensitivity and increased productivity due to minimal sample preparation efforts across all applications.
- Optimized plasma observation modes without compromises
- Argon-neutral counter gas for unique sensitivity
- Detection from sub-ppb to percentage range in one run
- Minimal need for sample preparation
Exceed the limit with the high-frequency generator
Reliable and stable plasma performance in any sample matrix remains a challenge in ICP-OES. The high-frequency generator of the PlasmaQuant 9100 is designed to run any sample, including the direct analysis of extreme matrices. In addition to a significant extension of the application range, method robustness, precision and productivity are also enhanced by lower matrix specific detection limits and reduced sample preparation needs. Utilizing a heavy-duty four-winding induction coil, the free-running 40 MHz power tube generator readily transfers power ranging from 700 to 1700 W with the highest efficiency into plasma of exceptional length. Its unique high-power settings with instant RF power output matching, required for industrial routine analysis of materials like brines, metal concentrates and volatile organics make plasma collapse a relic of the past. Due to its fast warm-up, the plasma is stable within minutes and allows for cost-efficient shift-work operation.
- Outstanding plasma robustness for analyzing any sample matrix
- Superior accuracy and precision by running undiluted samples
- Maximum application flexibility
- Lowest matrix-specific detection limits